Photolithography station
A project developed in collaboration with North American universities, encompassing interdisciplinary fields such as electronics, optics, mechanics, and programming.
Project Details
The photolithography workstation is the flagship project of our scientific association, combining innovative engineering solutions with practical applications in semiconductor technology. Its goal is to enable the fabrication of microstructures with resolutions down to 2 µm—a crucial step in the production of advanced electronic components such as diodes, photodetectors, and integrated circuits. At the heart of the system is a DLP projector equipped with a precisely selected ultraviolet (UV) light source. A specialized optical system collimates and shapes the light, ensuring uniform substrate exposure with minimal distortion. Integral to the workstation are precision positioning manipulators, allowing for nanometer-level alignment of the pattern with the substrate. This project seamlessly integrates cutting-edge engineering concepts with a practical approach to modern technological challenges, marking a significant step forward in the development of high-precision photolithography for optoelectronics.
Project Authors
Jakub Klimkowski
Project Lead
Paweł Wojeński
Software Engineer
Kamil Kozak
Optical Engineer
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Project Collaborators
